Harmonized Tariff Schedule of the U.S. › Chapter 84 Nuclear reactors, boilers, machinery and mechanical appliances; parts thereof
8486.20.00.00Tariff line
Classification path
Machines and apparatus of a kind used solely or principally for the manufacture of semiconductor boules or wafers, semiconductor devices, electronic integrated circuits or flat panel displays; machines and apparatus specified in note 11(C) to this chapter; parts and accessories
8486
Machines and apparatus for the manufacture of semiconductor devices or of electronic integrated circuits
8486.20.00.00
Rates of duty
General rate (Column 1)Free
Special—
Column 235%
UnitNo.
Printed page 2862
Measure flags
for origin CN, entry date 2026-10-25 · base rate Free
- Section 301 forced-labor tariff (12.5%)9903.05.86ExemptexemptOn the note 52(b) general exemption list (exempt by HTS line; enter under 9903.05.86)
- China 301 List 2 (9903.88.02)9903.88.02Applies+25%8-digit subheading 8486.20.00 is on L2
- 301 exclusion 9903.88.70 (by product description)9903.88.70ConditionalexemptTexturing, etching, polishing, and cleaning machines designed to prepare, repair, clean, etch, polish or texture the solar wafer substrate, whether or not integrated with automation equipment for transferring solar wafers from one process station to the next, all the foregoing for use in solar wafer manufacturing — only the products described; expires 2026-11-09 11:59 p.m. EDT
- 301 exclusion 9903.88.70 (by product description)9903.88.70ConditionalexemptThermal diffusion quartz-tube furnaces, designed to diffuse dopant impurities into square or rectangular silicon wafers, whether or not integrated with automation equipment for transferring solar wafers from one process station to the next or boat loading or unloading machines, all the foregoing for use in solar cell manufacturing — only the products described; expires 2026-11-09 11:59 p.m. EDT
- 301 exclusion 9903.88.70 (by product description)9903.88.70ConditionalexemptPlasma-enhanced or low-pressure chemical vapor deposition machines designed to deposit amorphous or nanocrystalline layers on one or both surfaces of a solar wafer, whether or not integrated with automation equipment for transferring solar wafers from one process station to the next, all the foregoing for use in solar cell manufacturing — only the products described; expires 2026-11-09 11:59 p.m. EDT
- 301 exclusion 9903.88.70 (by product description)9903.88.70ConditionalexemptPhysical vapor deposition (PVD) machines, designed to deposit a thin film of transparent conducting oxide on one or both surfaces of a solar wafer, whether or not integrated with automation equipment for transferring solar wafers from one process station to the next, all the foregoing for use in solar cell manufacturing — only the products described; expires 2026-11-09 11:59 p.m. EDT
- 301 exclusion 9903.88.70 (by product description)9903.88.70ConditionalexemptScreen printing line machines, including sintering furnaces for printing conducting contacts on both surfaces of a solar wafer, whether or not integrated with automation equipment for transferring solar wafers from one process station to the next, and whether or not integrated with equipment for solar cell testing, all the foregoing for use in solar cell manufacturing — only the products described; expires 2026-11-09 11:59 p.m. EDT
Confirmed total 25% · max 25%Full duty breakdown →